Reduction in cleaning time and better result…
Manufacturers of semiconductor devices and polycrystalline silicon are using various solutions in their decontamination process of different tooling. Especially in production equipment where depositions occurs must be kept extremely clean to prevent contamination. Solvents, acids, wire brushing, scrapers are just some of the methods for cleaning.
Polartech dry ice blasting provides a solution for the cleaning applications both as manual systems as well as robotic solutions. Using PolarTech technology means reducing cleaning time and costs and at the same time increasing product quality and reduced downtime in production.
PolarTech technology is a nontoxic process and minimizes or even substitutes completely the use of solvents and chemicals hence it is far safer to use for the operator and is environmentally friendly. Dry ice blasting is non-abrasive meaning you are not doing any damage to equipment or electronics.
The technology is not generating secondary waste. Faster cleaning and cleaning in-situ (no need for dismantling) means that overall cleaning costs are reduced radically. The result is a fast payback on your ROI.
- Removal of build-up in
- CVD reactors.
- Diffusion parts.
- Polish parts.
- Photo parts.
- Etch parts.
- Increase of equipment utilization (up to 35 %).
- Improvement of probe yield.
- Lower total particle counts.
- No chemicals / solvents.
- Cleaning in situ (no need for dismantling).
- No secondary waste generated.
- Dry cleaning process.
- Non-abrasive (no damage to equipment / tooling).
- Reduce downtime.
- Environmentally friendly.
- Fast return on investment.